1. Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology
پدیدآورنده : by Christopher L. Borst, William N. Gill, Ronald J. Gutmann
کتابخانه: کتابخانه پردیس بین الملل كیش دانشگاه تهران (هرمزگان)
موضوع : Interconnects (Integrated circuit technology),Semiconductors -- Polishing,Grinding and polishing,Chemical mechanical planarization
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